Intel has reached a significant milestone in working with ASML’s lithography system ASML High-NA which is based on ultraviolet radiation. For testing purposes, the machine was applied to a silicon wafer treated with light-sensitive chemicals to be capable of receiving a circuit pattern. The system will become a part of Inter’s first lithography machine which is currently being built. The test proved to be successful and the machine is now considered operational though not yet at the maximum of its performance.
Ultraviolet radiation-based lithography is a promising area, that major microchip manufacturers, including Intel, Samsung, and TSMC are going to switch to. In particular, Intel intends to use the system for the upcoming Intel 14A.
It’s important to mention that the light source is one of the most complex elements of any lithography tool using extreme ultraviolet.
