New generation lithography from ASML
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11:55, 09.10.2026
Instead, the most advanced chip manufacturing technology, High-NA EUV, in ten years or so – there will be Hyper-NA EUV. Such insight information was announced by the engineers from ASML.
Insights regarding the new lithography technology
New Hyper-NA technology will help to produce chips with much smaller components. The Dutch company has already started the development of the system, but the final decision about its mass production isn’t clear, for now.
Hyper-NA will continue to use 13.5-nm EUV radiation, but will additionally have an optical system with a higher numerical aperture. New technology would deliver a resolution of approximately 5 nm, and it could form features that are 38% smaller.
As for the chip manufacturers, only Intel has started to use High NA equipment. Samsung and TSMC are now using EUV lithography with the perspective of transitioning to High NA by 2030.
Zeiss can already cope with the manufacturing of mirrors with the precision needed for Hyper-NA. Creating systems better than Hyper-NA will most likely require even shorter wavelengths, but that stage isn't reachable now and is still in research.
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